IRDS: Lithography - Mark Neisser at INC 2019

197 views
Download
  • Share
#ICRC #2019 #Rebooting Computing #INC #Grenoble #France #computing #technology #devices #systems #planning #forecasting #roadmap #lithography #forecast pattern #HVM #logic #memory chips #EUV #nano imprint #stochastics #resist photospeed #3D flash memory #Moores Law

Mark Neisser, SEMATECH, reviews the Lithography working group and their mission/scope including forecast pattern technologies, high-volume manufacturing, and high-performance logic and memory chips. Neisser also covers the team’s challenges to More Moore, key changes to EUV (Extreme UltraViolet) and nano imprint lithography since 2017, stochastics, and the 2019 resist photospeed roadmap for lithography.

Mark Neisser, SEMATECH, reviews the Lithography working group and their mission/scope including forecast pattern technologies, high-volume manufacturing, and high-performance logic and memory chips. Neisser also covers the team’s challenges to More Moore, key changes to EUV (Extreme UltraViolet) and nano imprint lithography since 2017, stochastics, and the 2019 resist photospeed roadmap for lithography.